| 08:00-09:00 | Registration | ||
| 09:00-10:30 | Room 401/402 | Room 403 | Room 404 |
| EU-I EUV Lithography I |
MI-I Advanced Metrology and Inspection I |
AL/AM-I (Joint Session) Alternative Lithography & Algorithmic Molecular Patterning and Optical Device I |
|
| Chair: 이상설 (포항공대/가속기연구소) | Chair: 이명준 (삼성전자) | Chair: 이승우 (고려대) | |
| 10:30-10:50 | Break | ||
| 10:50-12:20 | Room 401/402 | Room 403 | Room 404 |
| EU-II EUV Lithography II |
MI-II Advanced Metrology and Inspection II |
AL/AM-II (Joint Session) Alternative Lithography & Algorithmic Molecular Patterning and Optical Device II |
|
| Chair: 이상설 (포항공대/가속기연구소) | Chair: 김욱래 (삼성전자) | Chair: 전석우 (KAIST) | |
| 12:20-13:30 | Lunch/Break | ||
| 13:30-14:30 | 4th Floor Lobby | ||
| PS Poster Session |
|||
| 14:30-16:10 | 405-408 | ||
| PL-I
Plenary Session I, Chair: 이명준 (삼성전자) Opening Ceremony 조직위원장 개회사, 안진호 (한양대) 한국광학회 회장 축사, 고도경 (GIST) Plenary Talk 1 AFM Technology for Next Gen Device and Lithography, 박상일 (Park Systems) Plenary Talk 2 Social Value of NGL, 김재현 (SK hynix) |
|||
| 16:10-16:30 | Break | ||
| 16:30-18:00 | 405-408 | ||
| Panel Discussion, Chair: 안기현 (한국반도체산업협회) 주제: “EUV 리소그래피 생태계 어디까지 왔나?” 패널: 박상일 (Park Systems), 김재현 (SK hynix), 이상설 (포항공대/가속기연구소), 김병국 (ESOL), 이승훈 (Youngchang Chemical), 신철 (S&S TECH), 권석준 (성균관대), 김학용 (KRISS) |
|||
| 18:00-20:00 | 마키노차야 광교점 | ||
| Banquet, 진행: 남정림 (한양대) Appreciation Remarks 프로그램위원장 감사의 말씀, 이준호 (공주대) |
|||
| 08:00-09:00 | Registration | ||
| 09:00-10:00 | 4th Floor Lobby | ||
| PS Poster Session |
|||
| 10:00-11:40 | 405-408 | ||
| PL-II
Plenary Session II, Chair: 김성수 (연세대) Welcome Speech 프로그램위원장 환영사, 이병호 (Hitachi High-Tech) Plenary Talk 3 The (R)Evolution of Lithography Optics from UV to EUV, Winfried Kaiser (Carl Zeiss) Plenary Talk 4 EUV HVM Status and the Roadmap Update, Kenji Morisaki (ASML) |
|||
| 11:40-13:00 | Lunch/Break | ||
| 13:00-14:30 | Room 401/402 | Room 403 | Room 404 |
| PM-I Patterning Materials I |
LO-I Layout Optimization and Computational Lithography I |
AL/AM-III (Joint Session) Alternative Lithography & Algorithmic Molecular Patterning and Optical Device III |
|
| Chair: 이진균 (인하대) | Chair: 양현조 (ASML) | Chair: 이승우 (고려대) | |
| 14:30-14:50 | Break | ||
| 14:50-16:20 | Room 401/402 | Room 403 | |
| PM-II Patterning Materials II |
LO-II Layout Optimization and Computational Lithography II |
||
| Chair: 진형민 (충남대) | Chair: 양현조 (ASML) | ||
| 16:20-16:40 | Break | ||
| 16:40-17:00 | 401/402 | ||
| CL
Closing Session, Chair: 김성환 (아주대) Best Student Paper Awards Ceremony 학생논문상 심사평, 김성환 (아주대) 학생논문상 시상, 정진항 (ASML) Closing Remarks 조직위원장 폐회사, 박종락 (조선대) |
|||
| ASML Tech Talk |
 |
NGL 2022 Secretariat: contact@ngl.or.kr |
| 이메일 |
|
| 비밀번호 |