2022 차세대 리소그래피 학술대회

2022 Next Generation Lithography Conference

The Next Decade Visioning for Lithography

Aug. 17 (Wed.) ~ 18 (Thu.), 2022
Suwon Convention Center, Suwon-si, Gyeonggi-do, Korea
Accompanying Event: ASML TechTalk [Aug. 19 (Fri.), 2022]
Session Track
Program at a Glance
August 17(Wed)
MI-I
Advanced Metrology and Inspection I
403,
09:00~10:30 KST
좌장: 이명준(삼성전자)
MI-I-1
09:00~09:30
High Throughput Scanning probe Microscopy for Semiconductor Metrology and Inspection 
*Hamed Sadeghian (Nearfield Instruments)
Abstract
MI-I-2
09:30-10:00
Advanced spectral metrology techniques for massive and precise 3D measurement
*Taejoong Kim (Samsung)
Abstract
MI-I-3
10:00~10:30
Expanding the role of CD-SEM technology for following the paradigm shift of semiconductor device
*Kyoungmo Yang (Hitachi Hightech Korea)
Abstract