2022 차세대 리소그래피 학술대회

2022 Next Generation Lithography Conference

The Next Decade Visioning for Lithography

Aug. 17 (Wed.) ~ 18 (Thu.), 2022
Suwon Convention Center, Suwon-si, Gyeonggi-do, Korea
Accompanying Event: ASML TechTalk [Aug. 19 (Fri.), 2022]
Invited Speakers
Layout Optimization and Computational Lithography Chair: 양현조 (ASML)
김영창 (Siemens EDA) Young Chang Kim (Siemens EDA)

Advances in OPC Etch Modeling
  • Principal Product Engineer in Modeling, Siemens EDA
  • Principal Engineer, Samsung Electronics R&D (1995 ~ 2018)
  • Samsung Assignee, IMEC (2000 ~ 2001)
  • Ph. D in Electrical Engineering, Katholieke Universiteit Leuven (KUL), Belgium

이경은 (SK hynix) KyungEun Lee (SK hynix)

Machine learning application in OPC area
  • Machine Learning part leader at SK hynix R&D
  • Project leader of AI Platform for OPC & Mask
  • Ph. D in Mechanical engineering, Korea Advanced Institute of Science and Technology

서정훈 (ASML US) Hoon Ser (ASML US)

High-NA computational Lithography for next generation patterning
  • Principal Design Engineer, Product engineering group, ASML Brion
  • Principal Engineer, SRD OPC team, Samsung Electronics
  • Principal Engineer, Opticis
  • Ph.D. in Physics, KAIST

Ulrich Klostermann (Synopsys)

Fast Rigorous Simulation for high-NA EUV Lithography - Deploy predictive and fast simulations to explore mask and patterning solutions
  • Product Engineering Manager, Synopsys, Munich
  • Customer Support and Product Engineering for S-Litho, Munich
  • New Memory Technology Development at Qimonda, Munich
  • MRAM Technology Ramp up at Altis Semiconductor, France
  • MRAM Technology Development at IBM Alliance, NY
  • Ph.D in Physics on Submicronmeter sized MRAM Devices, Regensburg University and Siemens AG, Germany

Patterning Materials Chair: 이진균 (인하대)
이정준 (듀폰) Jung June Lee (DuPont Electronics & Industrial)

Thin Film Properties of EUV Underlayer
  • 2018 ~ Present : Semiconductor Technology R&D in DuPont Electronics & Industrial
  • 2015 ~2018 : Semiconductor Technology R&D in DowDupont Electronics & Imaging
  • 2009 ~ 2015 : Semiconductor Technology R&D in Dow Chemical Electronic Materials

정병준 (서울시립대학교) Byung Jun Jung (University of Seoul)

Photolithography Process using Fluorinated Patterning Materials for OLED Displays
  • 2011 ~ Present: University of Seoul
  • 2006 ~ 2011: Johns Hopkins University, Postdoctoral Fellow, Assistant Research Scientist
  • 2004 ~ 2006: Samsung SDI, Senior Engineer
  • 1994 ~ 2004: KAIST, B.S. M.S. Ph.D.

장지현 (유니스트) Ji-Hyun Jang (UNIST)

Sn-based EUV Photoresist
  • 2008 ~ Present : 조교수, 부교수, 정교수, 에너지화학공학과, UNIST
  • 2003-2008 : 박사후 연수과정, 재료과, MIT
  • 2003. 박사, 화학과, KAIST
  • 1999. 석사, 화학과, KAIST
  • 1997. 학사, 화학과, 부산대학교

진형민 (충남대학교) Hyeong Min Jin (Chungnam National University)

Photo-thermal directed molecular self-assembly
  • 2022 ~ Present Assistant Professor, Department of Organic Materials Engineering, Chungnam National University
  • 2019 – 2022 Neutron Science Center, KAERI
  • 2018 – 2018 Postdoc Fellow, Pritzker School of Molecular Engineering, University of Chicago
  • 2017 – 2018 Postdoc Fellow, Department of Materials Science and Engineering, KAIST
  • 2017.02 Ph.D., Materials Science and Engineering, KAIST
  • 2013.02 M.S., Materials Science and Engineering, KAIST
  • 2011.02 B.S., Materials Science and Engineering, Yonsei University

이진균 (인하대학교) Jin-Kyun Lee (Inha University)

화학적/물리적 가교 결합에 기반한 불소화 극자외선 레지스트
  • 2010 ~ present: Professor (Dept. of Polymer Science & Engineering)
  • 2005~2010: Research associate (Cornell University)
  • 2005: Ph.D. Chemistry (Cambridge University)
  • 1998~2001: Research scientist (SK Corporation)

Alternative Lithography Chair: 전석우 (KAIST)
신종화 (한국과학기술원) Jonghwa Shin (KAIST)

Meta-masks for proximity-field nanopatterning
  • 한국과학기술원 신소재공학과 조교수/부교수 (2012-현재)
  • 한국과학기술원 물리학과 연구원 (2008-2011)
  • 스탠포드 대학교 전기공학 박사 (2008)
  • Current Optics and Photonics 수석부편집장 (2020-현재)
  • 한국광학회 Rising Stars 30 선정 (2020)
  • 한국광학회 학술이사 (20019)
  • 대한금속재료학회 신진학술상 (2017)

Xuegang Lu (Xi’an Jiaotong University)

Structurally colored materials based on Fe3O4@SiO2 colloidal quasi-amorphous arrays and their potential applications
  • Associate Professor, Department of Materials Physics, School of Physics, Xi’an Jiaotong University, China (2014-present): Bio-inspired optical material and its applications
  • Visiting Professor, Flexible Devices and Metamaterials Lab, Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology，KAIST (2022.02-present): Fabrication of 3D nanostructures and its applications

Algorithmic Molecular Patterning and Optical Device Chair: 이승우 (고려대)
권석준 (성균관대) Seok Joon Kwon (Sung Kyun Kwan Univ.)

Block-copolymer self-assembly-based nano-patterns with controlled complexity
  • 조교수, 성균관대 화학공학부(2021~)
  • 책임연구원, 한국과학기술연구원 (KIST) 첨단소재연구본부 (2004~2021)
  • 부교수, 과학기술연합대학원 (UST) NT-IT 융합전공 (2018~2021)

우성욱 (포항공대) Sungwook Woo (POSTECH)

DNA-based self-assembly towards programmable nanoscale patterning
  • 포항공과대학교 화학과 연구조교수
  • Damon Runyon HHMI Fellow, Wyss Institute, Harvard University & Department of Systems Biology, Harvard Medical School (2014 ~ 2021)
  • Ph.D. in Bioengineering, California Institute of Technology (2013)

윤동기 (한국과학기술원), Dong Ki Yoon (KAIST)

Topological defects of soft matter in the confined geometries
  • KAIST 화학과 교수
  • 現 한국고분자학회 국제협력위원회 부위원장
  • 現 한국정보전자디스플레이 사업이사 (KIDS)
  • 現 JID, BKCS Associate Editor

심우영 (연세대학교) Wooyoung Shim (Yonsei University)

Parallel nanofabrication and nanoimaging
  • 연세대학교 신소재공학과 부교수
  • 現 Nano Convergence (Springer Nature), Associate Editor
  • 現 연세대학교 다차원소재 연구단, 단장
  • 現 연세대학교 공학연구원, 부원장
  • 現 연세대학교 나노의학 IBS연구단, IBS 교수
  • 現 나노기술연구협의회, 정책사업기획위원
  • 現 국가나노기술정책센터, 제4기 국가나노기술지도 총괄위원
  • 現 한국세라믹학회, 학술운영이사
  • 現 대한금속재료학회, 융합재료과학분과 자문위원
  • 現 한국재료학회, 산학이사

정운룡 (포항공대) Unyong Jeong (POSTECH)

Microparticle-based Patterning and Fabrication of Deformable Devices
  • 2021.5 ~ 현재: Fellow, Royal Society of Chemistry
  • 2020.2 ~ 현재: Associate Editor of Materials Advances
  • 2019.2 ~ 현재: Associate Editor of Journal of Materials Chemistry C
  • 2015.3 ~ 현재: 교수, 포항공과대학교 신소재공학과
  • 2006.3 ~ 2015.02: 조/부교수, 연세대학교 신소재공학과
  • 2003.10 ~ 2006.1: 박사후 연구원, 미국 워싱턴 주립대, 화학과
  • 2000.3 ~ 2003.8 (Ph.D.): 포항공과대학교, 화학공학과
  • 1998.3 ~ 2000.2 (M.A.): 포항공과대학교, 화학공학과
  • 1992.3 ~ 1998.2 (B.S.): 포항공과대학교, 화학공학과

EUV Lithography Chair: 이상설 (포항공대 가속기연구소)
김병국 (이솔) Byung Gook Kim (ESOL, Inc.)

Actinic EUV metrology
  • [2019-現] 주식회사 이솔 대표이사 / CEO
  • [2008–2019] 삼성전자 Mask 개발팀 프로젝트 리더
  • [1995-2007] 삼성전자 반도체 연구소 Photomask팀 책임
  • [2001-2003] (日) SELETE (반도체 첨단 테크놀로지) 파견 연구원
  • [2000-2001] (美) 벨 연구소 파견 연구원
  • [2014-現] (美) SPIE Photomask Technology & EUV Lithography 프로그램 위원
  • [2012-現] (日) Photomask Japan 프로그램 위원
  • [2020-現] 차세대 리소그래피 학술대회 조직위원
  • Indiana Univ. Kelley Business School MBA
  • 연세대학교 화학과 학사, 석사

유부엽 (에프에스티) Bu Yeob Yoo (FINE SEMITECH CORP.)

Introduction for EUV Light Source in FST
  • [2019~現] 주식회사 에프에스티 부설연구소 상무
  • [2010~現] 주식회사 에프에스티 부설연구소 EUV 광원 개발 팀장

김용대 (에스앤에스텍) Yongdae Kim (S&S TECH)

EUV blank mask 개발 현황
  • [2021-現] 에스앤에스텍 Senior Research Fellow / EUV Blank mask development
  • [2006-2021] SK하이닉스 수석 연구원 / patterning process, new materials for EUV mask.

김태곤 (한양대) Tae-Gon Kim (Hanyang University)

Local Selective Cleaning for EUV Pellicle Lifetime Extension
  • [2019-現] 한양대학교 ERICA, 스마트융합공학부 교수
  • [2022- 現] SEMI Korea, STS 운영위원
  • [2022- 現] 한국세정협의회, 총무이사
  • [2022- 現] 한국표면분석학회, 소자응용분과위원장
  • [2010-2019] imec, Senior researcher
  • [2008-2010] imec/Katholieke Universiteit Leuven, Postdoc fellow
  • [1995-2008] 한양대학교, 학사, 석사, 박사

Gregory Denbeaux (SUNY POLYTECHNIC INSTITUTE)

Controlling EUV resist stochastics
  • Associate Professor, SUNY POLYTECHNIC INSTITUTE, 2003-present
  • Staff Scientist, Center for X-ray Optics, Berkeley Lab, 2000-2003
  • Ph.D., Duke University, 1999
  • B.A., Wesleyan University, 1993

Torsten Feigl (optiX fab)

A quarter century of EUV multilayer optics at Fraunhofer IOF and optiX fab
  • CEO, optiX fab, 2013-present
  • Group Leader, “EUV and soft X-ray optics” working group, Fraunhofer IOF, 1994-2013
  • MBA, Bradford University School of Management, 2004
  • Ph.D., Friedrich-Schiller-University, 2000

Advanced Metrology and Inspection Chair: 이명준 (삼성전자)
김태중 (삼성전자) Taejoong Kim (Samsung Electronics)

Advanced spectral metrology techniques for massive and precise 3D measurement
  • Technical Leader, Samsung Electronics (2019 ~ Present)
  • R&D Engineer, Samsung Electronics (2013 ~ 2018)
  • R&D Engineer, Nanoscope Systems (2009 ~ 2012)
  • Ph.D, Mechanical Engineering, KAIST (2009)

Mochi Iacopo (Paul Scherrer Institut)

Lensless EUV metrology for mask and wafer inspection
  • Scientist @ Paul Scherrer Institut (PSI), 2016 ~ present
  • R&D Engineer @ IMEC, 2015 ~ 2016
  • Scientist @ LBNL, 2008 ~2013
  • Post-Doc, Istituto Nazionale di Astrofiscia, Italy, 2005 ~ 2008
  • Ph.D, Physics Università degli Studi della Basilicata

Hamed Sadeghian (Nearfield Instrument)

High Throughput Scanning probe Microscopy for Semiconductor Metrology and Inspection
  • CEO/CTO of Nearfield Instruments, 2016 ~ present
  • System Architect and Scientific Director Nano-Optomechatronics Instrumentation (NOMI, ~30 FTE) @ TNO, 2011-2018
  • PhD (Cum Laude) in 2010 from Delft University of Technology.
  • MBA degree Vlerick Business School, Belgium, 2014
  • Founder of Jahesh Poulad Co. manufacturer of mechanical equipment, 2001.
  • Principal Scientist, Kruyt member of TNO
  • Part time Associate Professor, Technical University of Eindhoven
  • Holds more than 70 patents, and more than 100 Peer-reviewed technical papers

Jonathan Fan (Stanford University)

Metasurface-enabled spectral and polarization control for advanced metrology systems
  • Associate Professor, Electrical Engineering, Stanford University (2014 ~ present)
  • Post-Doc, University of Illinois, Urbana-Champaign
  • PhD, Harvard University, Applied Physics (2010)
  • MS, Harvard University, Applied Physics (2006)
  • BSE, Princeton University, Electrical Engineering (2004)

유홍기 (KAIST) Hongki Yoo (KAIST)

Ultrafast 3D surface imaging and maskless lithography
  • Associate professor, Dept of Mechanical Engineering, KAIST, 2019 ~ present
  • Associate professor, Hanyang University, 2012 ~ 2019
  • Post-doc, Harvard Medical School & Massachusetts General Hospital
  • Ph.D, M.S, B.S., KAIST

양경모 (히타치하이테크) Kyoungmo Yang (Hitachi High-Tech)

Expanding the role of CD-SEM technology for following the paradigm shift of semiconductor device
  • Vice President, Hitachi High Technologies, Korea
  • Word wide Account Manager and Marketing Manager, Hitachi High Technologies, Japan
  • Principal Product Engineer for Metrology and Inspection, Applied Materials, Korea
  • Principal Engineer, Metrology and Inspection team, Samsung Electronics