2022 차세대 리소그래피 학술대회

2022 Next Generation Lithography Conference

The Next Decade Visioning for Lithography

Aug. 17 (Wed.) ~ 18 (Thu.), 2022
Suwon Convention Center, Suwon-si, Gyeonggi-do, Korea
Accompanying Event: ASML TechTalk [Aug. 19 (Fri.), 2022]
Session Track
Program at a Glance
August 18(Thu)
LO-I
Layout Optimization and Computational Lithography I
403,
13:00~14:30 KST
좌장: 양현조(ASML)
LO-I-1
13:00~13:30
High-NA computational Lithography for next generation patterning
*Jung-Hoon Ser (ASML US)
Abstract
LO-I-2
13:30~14:00
Advances in OPC Etch Modeling
*Young-Chang Kim (Siemens EDA)
Abstract
LO-I-3
14:00~14:30
Machine Learning application in OPC area
KyungEun Lee, Sungho Kim, Jongchan Lee, Jinho Yang, Hyeonseok Yeon, Sungwoo Ko, Cheolkyun Kim, *Chanha Park (SKHynix)
Abstract