2022 차세대 리소그래피 학술대회

2022 Next Generation Lithography Conference

The Next Decade Visioning for Lithography

Aug. 17 (Wed.) ~ 18 (Thu.), 2022
Suwon Convention Center, Suwon-si, Gyeonggi-do, Korea
Accompanying Event: ASML TechTalk [Aug. 19 (Fri.), 2022]
Session Track
Program at a Glance
August 17(Wed)
EU-I
EUV Lithography I
401/402,
09:00~10:30 KST
좌장: 이상설(포항공대/가속기연구소)
EU-I-1
09:00~09:30
Introduction for EUV Light Source in FST
*BuYeob YOO (FST Corp.)
Abstract
EU-I-2
09:30-10:00
A quarter century of EUV multilayer optics at Fraunhofer IOF and optiX fab
*Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Philipp Naujok, Klara Stallhofer, Tina Seifert, Ernesto Roa Romero, Annika Schmitt, Florian Scheinpflug (optiX fab GmbH)
Abstract
EU-I-3
10:00~10:30
A Study on the Imaging Characteristics of Phase Shift Mask for EUV Technology with novel Material
*김용대 (에스앤에스텍)
Abstract