2022 차세대 리소그래피 학술대회

2022 Next Generation Lithography Conference

The Next Decade Visioning for Lithography

Aug. 17 (Wed.) ~ 18 (Thu.), 2022
Suwon Convention Center, Suwon-si, Gyeonggi-do, Korea
Accompanying Event: ASML TechTalk [Aug. 19 (Fri.), 2022]
Session Track
Program at a Glance
August 18(Thu)
PM-II
Patterning Materials II
401/402,
14:50~16:20 KST
좌장: 진형민(충남대)
PM-II-1
14:50~15:20
Thin Film Properties of EUV Underlayer
*Jung June Lee, Jae Hwan Sim, Yoo-Jin Ghang, Jae Yun Ahn, Jae-Bong Lim, Joo Sung Lee, Min Young Jeong, Soojung Leem, Youngeun Bae, Yinjie Cen (DuPont Electronics & Industrial, Semiconductor Technology R&D), James R. Marsh, Lei Zhang (DuPont Science & innovation)
Abstract
PM-II-2
15:20~15:50
화학적/물리적 가교 결합에 기반한 불소화 극자외선 레지스트
*이진균 (인하대학교)
Abstract
PM-II-3
15:50~16:05
Method of holographic inscription to fabricate sinusoidally modulated optical volume gratings
손희주, 임용준, 김광진, 백동재, 홍승재, 방준하, *이승우 (고려대학교)
Abstract
PM-II-4
16:05~16:20
홀로그래픽 광고분자를 통한 홀로그램 광학소자의 제작 및 분석
김광진, 백동재, 임용준, 손희주, *이승우 (고려대학교)
Abstract