2022 차세대 리소그래피 학술대회

2022 Next Generation Lithography Conference

The Next Decade Visioning for Lithography

Aug. 17 (Wed.) ~ 18 (Thu.), 2022
Suwon Convention Center, Suwon-si, Gyeonggi-do, Korea
Accompanying Event: ASML TechTalk [Aug. 19 (Fri.), 2022]
Session Track
Program at a Glance
August 18(Thu)
LO-II
Layout Optimization and Computational Lithography II
403,
14:50~16:20 KST
좌장: 양현조(ASML)
LO-II-1
14:50~15:20
Fast Rigorous Simulation for high-NA EUV Lithography - Deploy predictive and fast simulations to explore mask and patterning solutions
*Ulrich Klostermann (Synopsys)
Abstract
LO-II-2
15:20~15:35
EUV 노광에 의한 wafer 열변형이 overlay 와 CD uniformity 에 미치는 영향 
Hee-chang Ko, Won-Young Choi, Ji-Hyun Jeon, Ji-Hyun Lee, Ji-Won Kang, *Hye-Keun Oh (Hanyang University)
Abstract
LO-II-3
15:35~15:50
Finite Element Analysis of Extreme Ultraviolet Pellicle Contaminations
*김상곤 (홍익대학교)
Abstract
LO-II-4
15:50~16:05
Refragmentation Using Machine Learning for Efficient Optical Proximity Correction
Gangmin Cho, Yonghwi Kwon, Taeyoung Kim, *Youngsoo Shin (KAIST)
Abstract
LO-II-5
16:05~16:20
Lithography Hotspot Pattern Synthesis Using Generative Network with Hotspot Probability Model
Byungho Choi, Gangmin Cho, Yonghwi Kwon, *Youngsoo Shin (KAIST)
Abstract