2022 차세대 리소그래피 학술대회

2022 Next Generation Lithography Conference

The Next Decade Visioning for Lithography

Aug. 17 (Wed.) ~ 18 (Thu.), 2022
Suwon Convention Center, Suwon-si, Gyeonggi-do, Korea
Accompanying Event: ASML TechTalk [Aug. 19 (Fri.), 2022]
Session Track
Program at a Glance
August 17(Wed)
MI-II
Advanced Metrology and Inspection II
403,
10:50~12:20 KST
좌장: 김욱래(삼성전자)
MI-II-1
10:50~11:20
Metasurface-enabled spectral and polarization control for advanced metrology systems 
*Jonathan Albert Fan (Stanford University)
Abstract
MI-II-2
11:20~11:50
Ultrafast 3D surface imaging and maskless lithography
*Hongki Yoo (KAIST)
Abstract
MI-II-3
11:50~12:20
Lensless EUV metrology for mask and wafer inspection
*Iacopo Mochi (Paul Scherrer Institute)
Abstract