Synthesis and photolithography of perfluoroalkylated photoresist based on tin oxide with high etching resistance for EUVL
안형주, *이진균 (인하대학교)
Possibility of perfluoroalkylated metallophthalocyanine as EUV resist
최민규, *이진균 (인하대학교)
Characterization of electrode patterns fabricated by using plating method for flexible printed circuit boards
*Sung-Jei Hong, Chul Jong Han (Korea Electronics Technology Institute), Hyontae Kim (PRO 2000 co., Ltd.), Jeong Beom Park, Sang Hyeok Hong, Ajin Jo (Korea Electronics Technology Institute)
Metal oxide nanoparticle inks: unconventional patterning materials
Hojun Kim, Phuoc Loc Truong, Phuong-Danh Bui, Gichan Kim, *Daeho Lee (Gachon University)
Area-Selective Deposition of oxide thin films for nano-patterning
Jieun Kim, *Jung Wook Lim, *Sung-Hoon Hong (Electronics and Telecommunications Research Institute, University of Science and Technology)
Synthesis and characterization of hydrogen silsesquioxane/tin oxo cluster blend material for EUV photoresist
Jiyoung Bang, Hyeok Yun, Wonchul Kee (전남대학교), Siwoo Noh, Ki-Jeong Kim (Pohang Accelerator Laboratory, POSTECH), *Hyun-Dam Jeong (전남대학교)
An effective method for the fabrication of perfect optical Fourier elements
임용준, 김광진, 백동재, 손희주, 홍승재, 방준하, *이승우 (Korea University)
A Newly Synthesized Tin Oxo Cluster for Extreme Ultraviolet (EUV) Photoresist
Hyeok Yun, Jiyoung Bang (Chonnam national university), Siwoo Noh, Geonhwa Kim, Ki-Jeong Kim (Pohang Accelerator Laboratory), *Hyun-Dam Jeong (Chonnam national university)
Newly Synthesized Tin Oxo Cluster Resist for EUV Lithography
Minyeop Kim, Hyeok Yun, Jiyoung Bang (Chonnam National University), Siwoo Noh, Geonhwa Kim, Ki-Jeong Kim (POSTECH), *Hyun-Dam Jeong (Chonnam National University)
Dill과 Mack 모델을 이용한 포토레지스트의 특성 측정에 관한 연구
박승태, 권해혁, *박종락 (조선대학교)
