2022 차세대 리소그래피 학술대회

2022 Next Generation Lithography Conference

The Next Decade Visioning for Lithography

Aug. 17 (Wed.) ~ 18 (Thu.), 2022
Suwon Convention Center, Suwon-si, Gyeonggi-do, Korea
Accompanying Event: ASML TechTalk [Aug. 19 (Fri.), 2022]
Session Track
Program at a Glance
August 17(Wed)
AL/AM-II
Alternative Lithography & Algorithmic Molecular Patterning and Optical Device II (Joint Session)
404,
10:50~12:20 KST
좌장: 전석우(KAIST)
AL/AM-II-1
10:50~11:20
Topological defects of soft matter in the confined geometries
Geonhyeong Park, *Dong Ki Yoon (KAIST)
Abstract
AL/AM-II-2
11:20~11:50
Parallel nanofabrication and nanoimaging
*Wooyoung Shim (Yonsei university)
Abstract
AL/AM-II-3
11:50~12:05
Microfluidic multi-junction design for high-viscosity fluids
Hyeon Ho Kim, Kyung Hoon Rho, YongDeok Cho, Dongjae Baek, Sung Hun Park, *Seungwoo Lee (KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, Korea.)
Abstract
AL/AM-II-4
12:05~12:20
Selenium Colloidal Monolayer Fabricated by Self-Assembly
권민 (Korea university), 조용덕, 임은지, *이승우 (Korea University)
Abstract